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REVERSED
Tech Center 1700 Chemical & Materials Engineering
1733 Ex Parte Yousefiani et al 13948260 - (D) INGLESE 102/103 YEE & ASSOCIATES, P.C. YANG, JIE

Tech Center 2100 Computer Architecture and Software
2163 Ex Parte Poon et al 14170494 - (D) SHAW 102/103 Dell c/o Jackson Walker L.L.P. DANG, THANH HAT

Tech Center 2600 Communications
2667 Ex Parte COBB et al 13722812 - (D) MacDONALD 103 BAKER & HOSTETLER LLP BALI, VIKKRAM

Tech Center 2800 Semiconductors, Electrical and Optical Systems and Components
2834 Ex Parte Higuchi 13669531 - (D) NAGUMO 103 MYERS BIGEL, P.A. DESAI, NAISHADH N

3649 Ex Parte Howell et al 12922541 - (D) DOUGAL 103 McCarter & English LLP ACCOUNT: ILLINOIS TOOL WORKS INC. HARMON, CHRISTOPHER R

3668 Ex Parte McHugh et al 14024716 - (D) CALVE 103 BANNER & WITCOFF, LTD. TROOST, AARON L

Tech Center 3700 Mechanical Engineering, Manufacturing, and Products & Design
3721 Ex Parte BATZER et al 13873592 - (D) DOUGAL 103 KEATING & BENNETT, LLP SCHOPPE, ZIMMERMANN , STOCKELER & ZINKLER PATHAK, PRAACHI M.

AFFIRMED-IN-PART
3682 Ex Parte Tolompoiko et al 13165586 - (D) MEDLOCK 103 103 M&B IP Analysts, LLC DAGNEW, SABA

Tech Center 3700 Mechanical Engineering, Manufacturing, and Products & Design
3742 Ex Parte Marczi et al 11873838 - (D) HOELTER 102 102/103 CARMODY TORRANCE SANDAK & HENNESSEY LLP NGUYEN, PHUONG T

"It is the use of the words in the context of the written description and customarily by those skilled in the relevant art that accurately reflects both the 'ordinary' and the 'customary' meaning of the terms in the claims." Ferguson Beauregard/Logic Controls, Div. of Dover Res., Inc. v. Mega Sys., LLC, 350 F.3d 1327, 1338 (Fed. Cir. 2003).

Ferguson Beauregard/Logic Controls v. Mega Systems, 350 F.3d 1327, 69 USPQ2d 1001 (Fed. Cir. 2003)     2111.01

3745 Ex Parte Aiello et al 13314121 - (D) HOFFMANN 103 102/103 CARLSON, GASKEY & OLDS/PRATT & WHITNEY WHITE, ALEXANDER A

AFFIRMED
Tech Center 1600 Biotechnology and Organic Chemistry
1616 Ex Parte Chen et al 13407119 - (D) JENKS 112(2) 102/103 SOLVAY USA INC. KARPINSKI, LUKE E

1631 Ex Parte Lawson et al 13075350 - (D) KATZ 101/103 Dinsmore & Shohl LLP WHALEY, PABLO S

Tech Center 1700 Chemical & Materials Engineering
1787 Ex Parte Dennison et al 13521889 - (D) McGEE 112(1) 103 3M INNOVATIVE PROPERTIES COMPANY SHUKLA, KRUPA

Tech Center 2400 Networking, Multiplexing, Cable, and Security
2449 Ex Parte Lee et al 13367588 - (D) JEFFERY 103 IP LEGAL SERVICES, LLC CELANI, NICHOLAS P

Tech Center 2600 Communications
2632 Ex Parte Hossein et al 14363054 - (D) JURGOVAN 103 Peninsula Patent Group CADEAU, WEDNEL

2645 Ex Parte Xing et al 12298184 - (D) DEJMEK 103 FAY SHARPE/LUCENT NGUYEN, DINH

Tech Center 2800 Semiconductors, Electrical and Optical Systems and Components
2816 Ex Parte Lin et al 14593948 - (D) RANGE 103 SLATER MATSIL, LLP/TSMC OH, JAEHWAN

2859 Ex Parte Aronov et al 14623052 - (D) INGLESE 103 Pearl Cohen Zedek Latzer Baratz LLP PACHECO, ALEXIS BOATENG

Tech Center 3600 Transportation, Construction, Electronic Commerce, Agriculture, National Security, and License & Review
3621 Ex Parte Kopelman et al 11318003 - (D) MEDLOCK 102/103 101/102/103 SCHWEGMAN LUNDBERG & WOESSNER/EBAY P.O. BOX 2938 MINNEAPOLIS VAN BRAMER, JOHN W

3641 Ex Parte Tarazi 14642315 - (D) BROWNE 103 Taylor Intellectual LEE, BENJAMIN P
AFFIRMED 3741 Ex Parte Sun et al 14234712 - (D) MURPHY 103 Cantor Colburn LLP - Carrier DIAZ, MARCOS 0

Tech Center 3700 Mechanical Engineering, Manufacturing, and Products & Design
3763 Ex Parte Bork et al 12147605 - (D) STAICOVICI 102/103 JOHNSON & JOHNSON PATEL, SHEFALI DILIP

3786 Ex Parte Von Bucsh et al 14117873 - (D) FLAX 102/103 PHILIPS INTELLECTUAL PROPERTY & STANDARDS ROZANSKI, MICHAEL T