REVERSED
Tech Center 1700 Chemical & Materials Engineering
1759 Ex Parte Adlassnig 12441716 - (D) OGDEN 103 KLARQUIST SPARKMAN, LLP RUFO, LOUIS J
Tech Center 2100 Computer Architecture and Software
2128 Ex Parte Chen et al 13696437 - (D) WINSOR 103 GLOBAL IP SERVICES MAPAR, BIJAN
Tech Center 2800 Semiconductors, Electrical and Optical Systems and Components
2819 Ex Parte SASAKI et al 13920442 - (D) STRAUSS 102/103 Robinson Intellectual Property Law Office, P.C. MAZUMDER, DIDARUL A
Furthermore, Appellants correctly argue the Examiner’s reliance on routine optimization is improper. Modifications that would have been known to a person of ordinary skill are irrelevant to whether a reference anticipates a claim under 35 U.S.C. § 102. Titanium Metals Corp. v. Banner, 778 F.2d 775, 780 (Fed. Cir. 1985) (“[A]nticipation under § 102 can be found only when the reference discloses exactly what is claimed and that where there are differences between the reference disclosure and the claim, the rejection must be based on § 103 which takes differences into account.”) Still further, even under 35 U.S.C. § 103(a), the failure to provide sufficient evidence “that one skilled in the art would necessarily have appreciated the advantageous effects of providing a nitride insulating film in a semiconductor device within the claimed range” (App. Br. 13) renders a rejection based on obviousness improper.
2878 Ex Parte Kurokawa et al 13957559 - (D) OWENS 102/103 FISH & RICHARDSON P.C. (DC) LEGASSE JR, FRANCIS M
Tech Center 3600 Transportation, Construction, Electronic Commerce, Agriculture, National Security, and License & Review
3649 Ex Parte Zekavica et al 13387269 - (D) MARTIN 102/103 BUTZEL LONG, P.C. MCPARTLIN, SARAH BURNHAM
Tech Center 3700 Mechanical Engineering, Manufacturing, and Products & Design
3721 Ex Parte Schoon et al 13302429 - (D) WARNER 103 KIMBERLY-CLARK WORLDWIDE, INC. RUSHING-TUCKER, CHINYERE J
3747 Ex Parte Malmgren et al 13381482 - (D) MARTIN 102/103 OSTROLENK FABER LLP PICON-FELICIANO, RUBEN
AFFIRMED-IN-PART
Tech Center 2100 Computer Architecture and Software
2163 Ex Parte Lundberg et al 13310368 - (D) BUSCH 103 double patenting 41.50 112(2) SCHWEGMAN LUNDBERG & WOESSNER, P.A. THAI, HANH B
AFFIRMED
Tech Center 1700 Chemical & Materials Engineering
1744 Ex Parte Yang et al 13990093 - (D) TIMM 103 Husch Blackwell LLP The Dow Chemical Company LEYSON, JOSEPH S
1747 Ex Parte Mola 13231299 - (D) McGEE 103 MCKEE, VOORHEES & SEASE, P.L.C. YAARY, ERIC
1797 Ex Parte Potyrailo et al 12977568 - (D) ROBERTSON 103 GE GLOBAL PATENT OPERATION GE LICENSING (62204) EOM, ROBERT J
Tech Center 2800 Semiconductors, Electrical and Optical Systems and Components
2859 Ex Parte BUFORD 13418024 - (D) INGLESE 103 Cantor Colburn LLP-General Motors TORRES RUIZ, JOHALI ALEJANDRA
Tech Center 3600 Transportation, Construction, Electronic Commerce, Agriculture, National Security, and License & Review
3632 Ex Parte Graham 14121164 - (D) SILVERMAN 112(2)/103 Paul M. Denk WEINHOLD, INGRID M
3637 Ex Parte Thomas 14157517 - (D) SILVERMAN 103 Global Intellectual Property Agency, LLC ROERSMA, ANDREW MARK
3657 Ex Parte Sugawara et al 13266564 - (D) McNEILL 103 103/double patenting SUGHRUE MION, PLLC LANE, NICHOLAS J
Tech Center 3700 Mechanical Engineering, Manufacturing, and Products & Design
3736 Ex Parte Schraga 13524742 - (D) JESCHKE 112(1) 112(2)/103 GREENBLUM & BERNSTEIN, P.L.C. CERIONI, DANIEL LEE
3741 Ex Parte Pardington et al 11867195 - (D) GUIJT 102/103 41.50 103 HONEYWELL/LKGlobal KIM, TAE JUN
3744 Ex Parte Dirnberger et al 13576162 - (D) WIEDER 102/103 LERNER GREENBERG STEMER LLP MA, KUN KAI
REEXAMINATION
AFFIRMED
Tech Center 2600 Communications
2618 Ex parte SHIINE MICRO INC. and SOFTWARE RADIO TECHNOLOGY PLC, Appellants Ex Parte 7512095 et al 10709928 90013498 - (D) POTHIER 102 DORSEY & WHITNEY, LLP - Denver For THIRD PARTY REQUESTOR: LOWE GRAHAM JONES, PLLC POKRZYWA, JOSEPH R
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